Taking nanolithography beyond semiconductors: "A new process for chemical patterning combines molecular self-assembly with traditional lithography to create multifunctional surfaces in precise patterns at the molecular level."
(Via Nanowerk News.)
Taking nanolithography beyond semiconductors
(Nanowerk News) A new process for chemical patterning combines molecular self-assembly with traditional lithography to create multifunctional surfaces in precise patterns at the molecular level. The process allows scientists to create surfaces with varied chemical functionalities and promises to extend lithography to applications beyond traditional semiconductors. The new technique, which could have a number of practical chemical and biochemical applications, will be described in the 22 December 2006 issue of the journal Advanced Materials by a team led by Paul S. Weiss, distinguished professor of chemistry and physics at Penn State and Mark Horn, associate professor of engineering science and mechanics at Penn State.